METRICS 2.0: A machine-learning based optimization system for IC design
Published in Workshop on Open-Source EDA Technology, 2018
Recommended citation: Hashemi, S., Ho, C. T., Kahng, A. B., Liu, H. Y., & Reda, S. (2018). METRICS 2.0: A machine-learning based optimization system for IC design. In Workshop on Open-Source EDA Technology (p. 21). https://woset-workshop.github.io/PDFs/2018/a21.pdf